Germanium sputtering targets consist of high-purity germanium metal. It is a hard and brittle material with a semi-metallic, off-white appearance.
It has a density of 5.35 g/cc, a melting point of 937°C, and a vapor pressure of 10 -4 Torr at 1,167°C. In the production of optical storage media and
optical coatings, it is often evaporated under vacuum to form layers. Other uses of this material are as an alloying agent and catalyst.
Germanium target preparation process
Material preparation - zone melting - chemical analysis - forging - rolling - annealing - metallographic inspection - machining - dimensional inspection
- cleaning - final inspection - packaging
Application of germanium sputtering targets
Application areas cover infrared optics, solar cells, fiber-optic communications, semiconductor special gases, PET catalysts and other industries.
Other alloy forms of germanium targets
Ge copper, gold germanium, germanium antimony tellurium alloy targets, etc.
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