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Sputtering Target Material

时间:2024-08-18   访问量:1004

Shijiazhuang Zhijin Technology Co., Ltd. is a professional supplier of PVD coating materials. We are committed to supplying suitable and high-quality metal sputtering targets and ceramic targets.

We can supply most of the metal materials on the periodic table, including rare earth metals. Sputtering targets are generally produced by vacuum melting and hot pressing. By controlling the technical parameters of forging, rolling and annealing processes, the sputtering targets have the characteristics of high density, low gas content, uniform internal structure, and users can obtain a constant erosion rate and high-purity uniform film during use. PVD process.

The purity of sputtering targets can reach 99%~99.999%, which is different from metals. The shape can be round, rectangular, cathode and rotating tube, and can also be produced according to the drawings provided by customers.

The following are some traditional metal targets and ceramic targets. By clicking on "Pictures or Text", you can learn more about target production processes, target performance and other aspects.

If the material you are looking for is not listed below, it does not mean that we cannot provide it. Please be sure to contact us by email or phone, and we will give you an accurate reply within 24 hours.

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